HamaTech APE Launches Mask Integrity Seminar

HamaTech APE recently launched a technical seminar in Asia for photomask manufacturing and lithography professionals facing mask integrity challenges for the introduction of EUVL.  Featuring discussions from industry experts in EUVL research, Metrology, Lithography and Photomask Processing, the seminar presented a comprehensive look at the unique characteristics of Next Generation Lithography reticles and investigated issues such as; particle size, surface layer influence and pattern damage, all critical to mask integrity.  HamaTech APE explored the technology behind cleaning solutions for the successful introduction of EUVL and provided answers to CD uniformity and overlay challenges for DPT and DPT2 extension technology. MaskTrack Pro is featured as the only photomask processing system ready today ready for mask integrity issues of tomorrow.  

With the ever-increasing pace of technology, companies face an era of challenges that requires focus and innovation to remain successful.  And, as device nodes get smaller the need gets bigger for equipment suppliers that fully understand customer challenges, align with technology partners to provide comprehensive solutions, willingly take risks to provide innovative solutions and continuously develop to maximize customer investments.  

For more than twenty years, HamaTech APE has delivered the equipment and services that enable advanced photolithography technology for the semiconductor and magnetic storage industries.  Customers around the world rely on our focus on photomask processing to produce semiconductor devices at every technology node and trust our commitment to innovation for the rapid introduction of products at each new generation.   Our equipment portfolio includes an established suite of systems that cover critical phases of blank and patterned mask manufacturing: Post-Exposure Bake, Develop, Strip and Clean.

At HamaTech, we believe that our customers' success is our responsibility.  

Understand.  Align.  Innovate.  Develop.