The MaskTrack Pro Bake//Develop system is part of HamaTech’s holistic mask integrity product family for Next Generation Lithography. Designed for challenges of sub-32nm lithography the MaskTrack Pro Bake/Develop protects even the most complex masks in the fab.

Standard Bake / Develop Configuration

• One process chamber station with revolutionary acoustic streaming ASonic develop technology
• Two post-exposure bake stations
  • 25-zone controlled precision hotplate
  • Coolplate stack
  • Storage for temperature sensor mask
• Automated bake optimization SW procedure
• CD uniformity optimization by profile bake
• High flexible tool controlling SW
• External media supply system
• ISO class 3 environmental control
• SEMI S2/S8 compliant