MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies that enables customers to effectively remove organic and inorganic contamination without damage to the vulnerable features and material structures of the reticle. The innovative design allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach critical for EUVL processing.

Two Chamber Advanced Lithography Configuration

• Up to three pre-clean and final-clean chambers
  • Unique in-situ UV surface preparation and cleaning
  • High frequency dual Megasonic cleaning up to 4MHz
  • Precision Nano Binary spray
  • High temperature dehydration (193i)
  • Soft RTP purification, dehydration and surface restoration (EUVL)
  • Ultra-clean Hot and Cold DI water
  • Electrolyzed H2 and Ozonated DI water, Ultra-Dilute SC1
• Web Cam wet process online monitoring
• Wet substrate transfer between pre and final clean chamber
• Dry flip functionality
• Low contact linear substrate transfer handling
• Multiple input/output and substrate buffer stations
• 172nm UV surface preparation
• Degassing DIW-H20 input functionality
• 30nm prcess media filtration