HamaTech APE Platforms

For over two decades, HamaTech has worked in close cooperation with customers, technology partners and OEM’s in the areas of lithography and mask manufacturing to develop an established suite of photomask processing equipment for Post Exposure Bake, Develop, Strip and Clean that span the full range of technology nodes, including Next Generation Lithography. 

With the introduction of each new technology node, the cost of the mask set, lithography and inspection have increased substantially and the need to control costs through innovations in photomask processing have taken on a new importance.  HamaTech’s unique development approach necessitates that the requirements of customers in the mask shops and wafer fabs are completely understood and aligned with technology partners to deliver products that guarantee the highest level of mask integrity.

Since 2005, the MaskTrack’s unsurpassed first-pass cleaning results are recognized in the industry to extend the lifetime of the mask set and provide significant savings to customers.

Released and shipped in 2009, Hamatech’s most advanced photomask processing platform, the MaskTrack Pro®, extends the technology of the highly successful MaskTrack System to Next Generation Lithography applications; 193i 22nm half pitch (hp), Extreme Ultraviolet Lithography (EUVL) and Nano-Imprint Lithography (NIL).