ASx Series

HamaTech’s ASx Series is the photomask processing platform for 250nm to 90nm technology nodes. With over 200 systems installed, the ASx Series has a proven track record in nearly every captive and merchant mask shop around the world. Customers depend on ASx Series for its reliability, stability and performance to meet critical challenges of defect-free processing of masks exposed to 248nm and 193nm lithography.

ASx Series platforms are the default choice for photomask manufacturing processes: Bake, Develop and Clean.

Advanced Single Substrate Cleaner ASC 5500

ASC 5500 ensures 100% soft defect removal, careful PSM cleaning and minimal residual ions during critical cleaning stages.

Resist strip and pre-clean
Final clean
Pellicle adhesive cleaning
Backside cleaning of pellicallized masks

ASC 5500 can be equipped for fully automated processing of multiple types of substrates:

Binary and phase shift masks
Photomasks and other square substrates up to 9”
Round Substrates (wafers or imprint masks) up to 300mm

Features and Benefits:

Highest first pass cleaning yield, resulting in extended mask life.
Minimal phase and transmission change.
Low residual ion concentrations avoiding haze.
Enables both dry and wet cleaning processes, reducing chemicals usage
- Dual Megasonic cleaning
- In-situ SC1
- In-Situ SPM
- 172nm UV dry cleaning
- Ultra-Clean hot DI rinse
ESD-safe cleaning
Monitoring PoU media parameters
Low cost of ownership with small footprint (1200 x 1200mm)
High reliability and uptime, proven by large installed base of > 200 systems (ASx series)
Fully automated, including SMIF load / unload
Equipment clustering option, e.g. with Pellicle mount station or inspection station

ASC 5500 meets and exceeds safety and ergonomic standards, SEMI S2-0302 and SEMI S8-0701, and is CE marked.