MaskTrack®

MaskTrack is a multi-purpose, fully-automated platform for imprint mask cleaning and critical photomask processing;  
Post Exposure Bake, Develop, Strip and Clean.   A unique dynamic process parameter control feature eliminates adjustment downtime in clean processes for multiple substrate use and ensures outstanding process uniformity results during bake and develop.  Since its introduction in 2005, over 30 MaskTrack systems have been shipped to industry leaders in the semiconductor industry: foundry, memory and microprocessor manufacturers.  The MaskTrack platform offers proven solutions for advanced processing at 90 – 32nm technology nodes.

MaskTrack Clean Features: Highest First-Pass Cleaning Yield 100% Particle Removal Efficiency Sulfate-Free Cleaning Complete Haze Elimination Maximum Preservation of Pattern Integrity Benefits: Lowest Cost of Ownership Zero Defect on Print Results Extends the Lifetime of Your Critical Mask Set
MaskTrack Bake & Develop Features: Dynamic Bake Control Unparalleled Mask Temperature Uniformity Impact-free A+ Nozzle Innovative Media Dispense System Benefits: Zero Pattern Collapse Total Defect-free Developing Best CD Uniformity Performance in the Industry