MaskTrack®
Post Exposure Bake & Develop Platform

The MaskTrack Post Exposure Bake and Develop platform is fully automated and specifically designed for advanced 90-45nm technology nodes. A unique dynamic bake process control function allows for extreme process uniformity, even during temperature ramp.

Standard 90 nm–45nm Configuration


Features

• Up to two (2) independently controlled  Bake / Chill  Stacks
  • Automated bake performance optimization.
  • 90-200 °C bake temperature control
  • Integrated temperature sensor array storage
  • Recipe fine-tuning based on CD-linewidth feedback
  • Interactive bake profile R6D module
• Process Chamber for Develop process step
  • Low impact A+ puddle nozzle
  • Dynamic Media Mix Control
  • Fan spray overlap process
  • Ultrasonic readout of all process media critical flow rates
  • Rinse and dry
• Low contact substrate handling
• Substrate buffer station
• 30nm process media filtration
• Compact footprint: 1530 x 2140 mm
• SEMI S2/S8 compliance
• Ready for factory automation via SECS/GEM 200 & 300mm standard interface
• ISO Class 3 (Fed Std 209e Class 1) environmental control
• FM 4910 approved