MaskTrack® (65-22nm)
Single Chamber Photomask Backside Cleaning System

MaskTrack is an automated sulphate-free photomask cleaning system specifically designed for cleaning of pellicallized masks for advanced 65-22nm technology nodes.  The MaskTrack Backside Cleaner platform is the perfect solution for wafer fab mask maintenance re-clean and specific problems caused by haze, which occur at 193nm lithography technology.    It is also suitable for R&D activities and small batch cleaning of mask blanks.

Standard 65 nm–22nm Configuration


Features

• Single substrate final clean process chamber
  • Special chuck design providing complete  protection of the pellicle, from process chemicals and rinse water
  • Megasonic cleaning
  • PVA Sponge cleaning
  • Micro droplet jetspray cleaning
  • Spin dry
  • Ultrasonic readout of all process media critical flow rates
  • Ultra-clean Hot DI water
  • Ultra-Diluted SC1, Hot N2 drying support
• Low contact substrate handling
• 50nm process media filtration
• Compact footprint:  1530 x 1540 mm
• SEMI S2/S8 compliance
• Ready for factory automation via SECS/GEM 200 & 300mm standard interface
• ISO Class 3 (Fed Std 209e Class 1) environmental control
• FM 4910 approved