| 1986: | | Hamatech was founded in Mühlacker, Germany, initially focused on development of equipment for; Etch, Coat, Clean and Dry processes designed for ceramic substrates and silicon wafers.
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| 1990: | | HamaTech expanded its portfolio with the entry into the photomask processing market. The HMx series was developed in close cooperation with IBM in Sindelfingen, Germany to serve a broad range of customers with technology nodes requirements between 3μm and 250nm and up to 245nm wavelengths. With over 250 systems installed worldwide, the HMx series positioned HamaTech as the partner of choice for captive and merchant mask shops.
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| 1991: | | HamaTech moved its headquarters to Sternenfels, Germany where it is still based today.
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| 1992: | | STEAG acquired 80% of HamaTech shares and began activities to develop and manufacture equipment for the Optical Disc market.
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| 1995: | | Marked the introduction of the ASC series, a photomask processing system for; Etch, Bake, Develop and Clean, designed to comply with customer requirements at 259nm to 90nm technology nodes. Over 200 ASC series systems have been installed with a large proportion still fully-operational at customer sites, demonstrating stability and continued low cost of ownership.
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| 1997: | | STEAG acquired the remaining 20% of HamaTech shares.
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| 1999: | | The company became a publicly traded company, STEAG HamaTech AG. Over time, STEAG HamaTech became a key player in the Optical Disc industry and its leadership in equipment for Recordable Disc was internationally acknowledged.
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| 2005: | | A remarkable year for HamaTech. Not only was STEAG HamaTech acquired by Singulus Technologies AG, Kahl am Main, the market leader for complete production lines of pre-recorded Optical Disc, but the first MaskTrack, a highly advanced photomask processing system was shipped. The MaskTrack, through its versatility and low cost of ownership was rapidly accepted as the platform of choice in the mask industry for 90nm, 65nm and 45nm processing. The MaskTrack is extendable and proven to meet all requirement at 32nm technology nodes. Over 30 MaskTrack platforms have been installed in mask shops and wafer fabs around the world.
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| 2006: | | All Optical Disc activities were consolidated under the Singulus Headquarters in Kahl am Main. HamaTech APE GmbH & Co Kg. was founded as a separate operating entity, focused on the development, design and manufacturing of systems for the Semiconductor (Photomask) and MagneticStorage (imprint mask) industries.
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| 2009: | | Released and shipped in 2009, Hamatech's most advanced photomask processing platform, the MaskTrack Pro®, extends the technology of the highly successful MaskTrack System to Next Generation Lithography applications; 193i 22nm half pitch (hp), Extreme Ultraviolet Lithography (EUVL) and Nano-Imprint Lithography (NIL).
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| 2010: | | SUSS MicroTec acquired HamaTech APE. With the acquisition, the SUSS MicroTec Group expanded its existing product portfolio and moved all production for wet processing equipment to the Sternenfels, Germany manufacturing facility. |
