MaskTrack® (45-32nm)
Dual Chamber Photomask Cleaning System

MaskTrack is an automated sulphate-free photomask cleaning system specifically designed for advanced 45nm – 32nm technology nodes.  The MaskTrack platform is ideally suited for wafer fab mask maintenance re-clean and mask shop final clean and resist processes.

Standard 45nm – 22nm Configuration


Features

• Separate pre-clean and final clean process chamber
  • Photon induced reactive species generation system
  • High frequency dual Megasonic cleaning
  • Micro droplet jetspray processing
  • Surface tension differential drying method
  • Ultrasonic readout of all process media critical flow rates
  • Ultra-clean Hot DI water
  • Electrolyzed H2 and Ozonated DI water, Ultra-Dilute SC1, Hot N2
• Wet  substrate transfer between pre and final cleaning chamber
• Wet  and dry flip functionality
• Low contact substrate handling
• Pellicalized mask handling capability
• Multiple input / output and substrate buffering stations
• 30nm process media filtration
• 172nm UV surface preparation
• High temperature substrate treatment up to 300°C for complete removal of residual  ions
• Compact footprint: 2130 x 2730 mm
• SEMI S2/S8 compliance
• Ready for factory automation via SECS/GEM 200 & 300mm standard interface
• ISO Class 3 (Fed Std 209e Class 1) environmental control
• FM 4910 approved